Xzero has developed a proprietary compact system for the production of Ultra Pure Water.

All substances, for example silica, boron, arsenic and nanoparticles, are separated.

No chemicals used

In the core module, Xzero uses water repellent (hydrophobic) membranes as a barrier for contaminants.

No pressure no high temperatures

The process takes place at temperatures below 100°C
and at ambient pressure.

All contaminants are removed

Contaminant that other systems may find difficult to remove, such as silica, TOC, arsenic, boron and the smallest nanoparticles are completely removed.

Yield rates

The quality of Ultra-pure water is an important factor for yield rate and profitability in nanoelectronics manufacturing

Yield rates
The Xzero system

The Xzero-system reaches higher purity by reducing the number of process steps, there are fewer sources of error than in today’s cutting-edge technology.

The Xzero system
About us

Xzero is a Swedish company that has spent 20 years in R&D for a new technology for process water in the micro- and nanoelectronics industries.

About us